본문

  1. Home
96 Results:UU:VOL49NO320069 0.421 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
1
Further Insights into the Mechanism of Hydrogen-Plasma Surface Passivation of Low-Dielectric Constant Hydrogen Silsesquioxane(HSQ)
Further Insights into the Mechanism of Hydrogen-Plasma Surface Passivation of Low-Dielectric Constant Hydrogen Silsesquioxane(HSQ)
Sunil Kumar Singh, | 한국물리학회 | 2006 ,
2
Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor
Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor
Gon-Ho Kim, | 한국물리학회 | 2006 ,
3
Atomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source
Atomic Layer Deposition of La₂O₃Thin films by Using an Electron Cyclotron Resonance Plasma Source
Beom-Yong Kim, | 한국물리학회 | 2006 ,
4
Development of New Method to Fabricate a Conductive Ball for an Anisotropic Conductive Film
Development of New Method to Fabricate a Conductive Ball for an Anisotropic Conductive Film
Mi Jung Lee, | 한국물리학회 | 2006 ,
5
Electro-Physical Properties of a Si-Based MIS Structure with a Low-Bftextitk SiOC(-H) Film
Electro-Physical Properties of a Si-Based MIS Structure with a Low-Bftextitk SiOC(-H) Film
Anvar Sagatovich Zakirov, | 한국물리학회 | 2006 ,
6
A Study of the Discharge Characteristics of a New Penning Gas in ac-PDPs
A Study of the Discharge Characteristics of a New Penning Gas in ac-PDPs
B. K. Joung, | 한국물리학회 | 2006 ,
7
Non-Plasma-Based Technologies to Augment Backend Processing in Future ULSI
Non-Plasma-Based Technologies to Augment Backend Processing in Future ULSI
Rajiv O. Dusane, | 한국물리학회 | 2006 ,
8
Electron Emission from Nano-Structured Carbon Composite Materials and Fabrication of High-Quality Electron Emitters by Using Plasma Technology
Electron Emission from Nano-Structured Carbon Composite Materials and Fabrication of High-Quality Electron Emitters by Using Plasma Technology
H. Hiraki, | 한국물리학회 | 2006 ,
9
Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
Hyeong Joon Kim, | 한국물리학회 | 2006 ,
10
Surfactant-Mediated Molecular Beam Epitaxy of ZnO
Surfactant-Mediated Molecular Beam Epitaxy of ZnO
H. Suzuki, | 한국물리학회 | 2006 ,
처음12345678910이후마지막