서브메뉴
검색
Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Hyeong Joon Kim
- 서명/저자
- Property ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition / Hyeong Joon Kim , Sang Yong No , Dail Eom , Cheol Seong Hwang
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1271-1275
- 기타저자
- Sang Yong No
- 기타저자
- Dail Eom
- 기타저자
- Cheol Seong Hwang
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60144245
MARC
008101007s2006 ulka a eng■022 ▼a03744884
■1001 ▼aHyeong Joon Kim
■24510▼aProperty ImProvement of Aluminum-Oxide Thin Films Deposited under Photon Radiation by Using Atomic Layer Deposition▼dHyeong Joon Kim▼eSang Yong No▼eDail Eom▼eCheol Seong Hwang
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1271-1275
■7001 ▼aSang Yong No
■7001 ▼aDail Eom
■7001 ▼aCheol Seong Hwang
■773 ▼tJournal of The Korean Physical Society▼gVol. 49 No. 3 (2006. 9)▼d2006, 09
■SIS ▼aS034322▼b60077342▼h8▼s2▼fP
