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1
Characteristics of n-Type SB-MOSFETs Manufactured by Using a Metal-Gate & a High-K Dielectric
Characteristics of n-Type SB-MOSFETs Manufactured by Using a Metal-Gate & a High-K Dielectric
Byoungchul Park, | 한국물리학회 | 2007 ,
2
Characterization of the dopant Dependence of Ni-silicide on a SOI Substrate for a Nano-Scale CMOSFET
Characterization of the dopant Dependence of Ni-silicide on a SOI Substrate for a Nano-Scale CMOSFET
Soon-Yen Jung, | 한국물리학회 | 2007 ,
3
Characterization and Improvement of Reverse Leakage Current of Shallow Silicided Junction for Sub-100 nm CMOS TEchnology Utilizing N₂PAI
Characterization and Improvement of Reverse Leakage Current of Shallow Silicided Junction for Sub-100 nm CMOS TEchnology Utilizing N₂PAI
Kyong-Jin Hwang, | 한국물리학회 | 2007 ,
4
Accurate Extraction of Crosstalk Induced Dynamic Variation of Coupling Capacitance for Interconnect Lines of CMOSFETs
Accurate Extraction of Crosstalk Induced Dynamic Variation of Coupling Capacitance for Interconnect Lines of CMOSFETs
Yong Goo-Kim, Hee-Hwan Ji, Hyung Sun Yoon, Sung H, | 대한전자공학회 | 2004 ,
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