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741
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
742
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
743
Alignment Effects for Nematic Liquid Crystal on a New Diamond - like Carbon Layer
Alignment Effects for Nematic Liquid Crystal on a New Diamond - like Carbon Layer
Yong Min Jo, | 한국전기전자재료학회 | 2003 ,
744
Regular paper : Properties of Indium Tin Oxide Transparent Conductive Thin Films at Various Substrate and Annealing Temperature
Regular paper : Properties of Indium Tin Oxide Transparent Conductive Thin Films at Various Substrate and Annealing Temperature
Woon Jo Jeong, | 한국전기전자재료학회 | 2003 ,
745
Regular paper : Effects of Deposition Temperature and Annealing Process on PZT Thin Films Prepared by Pulsed Laser Deposition
Regular paper : Effects of Deposition Temperature and Annealing Process on PZT Thin Films Prepared by Pulsed Laser Deposition
Min Chul Kim, | 한국전기전자재료학회 | 2003 ,
746
Regular paper : p-n Heterojunction Composed of n-ZnO / p-Zn-doped InP
Regular paper : p-n Heterojunction Composed of n-ZnO / p-Zn-doped InP
Eun Sub Shim, | 한국전기전자재료학회 | 2003 ,
747
Regular Paper : Optoelectronic Characteristics of Hydrogen and Oxygen Annealed Si / O Superlattice Diode
Regular Paper : Optoelectronic Characteristics of Hydrogen and Oxygen Annealed Si / O Superlattice Diode
Yong Jin Seo, | 한국전기전자재료학회 | 2002 ,
748
Regular Paper : Optical properties of β-In2S3 and β-In2S3:Co2+ Thin Films
Regular Paper : Optical properties of β-In2S3 and β-In2S3:Co2+ Thin Films
Hyung Gon Kim, | 한국전기전자재료학회 | 2002 ,
749
Liquid crystal alignment effects for the photo-aligned VA-LCD on the photo - polymer
Liquid crystal alignment effects for the photo-aligned VA-LCD on the photo - polymer
Jeoung Yeon Hwang, | 한국전기전자재료학회 | 2001 ,
750
Polishing Mechanism of TEOS-CMP with High-temperature Slurry by Surface Analysis
Polishing Mechanism of TEOS-CMP with High-temperature Slurry by Surface Analysis
Nam Hoon Kim, | 한국전기전자재료학회 | 2005 ,
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