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1
Low-Temperature Deposition of Silicon-Nitride Layers by Using PECVD for High Efficiency Si Solar Cells
Low-Temperature Deposition of Silicon-Nitride Layers by Using PECVD for High Efficiency Si Solar Cells
B. Karunagaran., | 한국물리학회 | 2006 ,
2
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Lee, June Hee, | 한국물리학회 | 2006 ,
3
Tribological Properties of Annealed Diamond-like Carbon Film Synthesized by RF PECVD Method
Tribological Properties of Annealed Diamond-like Carbon Film Synthesized by RF PECVD Method
Won Seok Choi, | 한국전기전자재료학회 | 2006 ,
4
Deposition Characteristics of Low Dielectric Constant SiOF Films Prepared by ECR PECVD
Deposition Characteristics of Low Dielectric Constant SiOF Films Prepared by ECR PECVD
Kyung-Mun Byun,Won-Jong Lee, | 대한금속.재료학회 | 2000 ,
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