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1
오존과 초음파를 이용한 실리콘 웨이퍼의 Post Sliced Cleaning
오존과 초음파를 이용한 실리콘 웨이퍼의 Post Sliced Cleaning
최은석, | 한국재료학회 | 2006 ,
2
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-, | 한국화학공학회 | 2001 ,
3
Physicochemical Characteristics of Waste Sea Shells for Acid Gas Cleaning Absorbent
Physicochemical Characteristics of Waste Sea Shells for Acid Gas Cleaning Absorbent
Jong Hyeon Jung, Byung Hyun Shon, Kyung Sun Yoo,, | 한국화학공학회 | 2000 ,
4
Effect of Rinsing and Drying on Silicon Surface Cleaning for Epitaxial Growth
Effect of Rinsing and Drying on Silicon Surface Cleaning for Epitaxial Growth
Hyoun Woo Kim,Kwang-Sik Kim, | 대한금속.재료학회 | 2002 ,
5
Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
Hyoun-Woo Kim,Kwang-Sik Kim, | 대한금속.재료학회 | 2002 ,
6
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Kwang-sik Kim,Hyoun-woo Kim, | 대한금속.재료학회 | 2001 ,
7
전기도금 전처리 시 Plasam Cleaning 적용에 관한 연구
전기도금 전처리 시 Plasam Cleaning 적용에 관한 연구
민병승,서근호,정원섭, | 대한금속.재료학회 | 2002 ,
8
The Confirmation Mess : Cleaning up the Federal Appointments Process
The Confirmation Mess : Cleaning up the Federal Appointments Process
Carter, Stephen L, 334-C323c | Basic Books | 1994 334-C323c,
9
버리고 비웠더니 행복이 찾아왔다 : 미니멀리스트 가족의 심플 라이프 노하우
버리고 비웠더니 행복이 찾아왔다 : 미니멀리스트 가족의 심플 라이프 노하우
야마구치 세이코, 595.4-야32버버 | 나라원 | 2016 595.4-야32버버,
10
(잡동사니로부터의) 자유
(잡동사니로부터의) 자유
팔머, 브룩스, 199.1-팔34자 | 초록물고기 | 2011 199.1-팔34자,
처음1마지막
1
Semiconductor Wafor Cleaning and Surface Characterization
대한금속재료학회(구 대한금속학회) [기계공학, ]