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1
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
2
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Yong-jin Seo., | 한국물리학회 | 2006 ,
3
Application of Potential-pH Diagram and Potentiodynamic Polarization of Tungsten
Application of Potential-pH Diagram and Potentiodynamic Polarization of Tungsten
Yong-Jin Seo, | 한국전기전자재료학회 | 2006 ,
4
DNA Endonuclease-and Active Oxygen-Associated Degradation of Chloroplast DNA in Response to Paraquat-Induced Oxidative Stress
DNA Endonuclease-and Active Oxygen-Associated Degradation of Chloroplast DNA in Response to Paraquat-Induced Oxidative Stress
Jin-Hyun Kim, Sung Ho Shin, Sung-Ho Cho, Woo-Sung, | 한국식물학회 | 2000 ,
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