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1
Theoretical Calculation and Experimental Verification of the Hf/A1 Concentration Ratio in Nano-mixed HfxAlyOz Films Prepared by Atomic Layer Deposition
Theoretical Calculation and Experimental Verification of the Hf/A1 Concentration Ratio in Nano-mixed HfxAlyOz Films Prepared by Atomic Layer Deposition
Deok-Sin Kil, | 대한전자공학회 | 2005 ,
2
Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor
Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(Co)₂ Precursor
Keunwoo Lee, | 한국물리학회 | 2007 ,
3
Improvement of Leakage Current Property of TIT Capacitor with Compositionally Stepped HfxAlyOz Thin Films
Improvement of Leakage Current Property of TIT Capacitor with Compositionally Stepped HfxAlyOz Thin Films
Deok Sin Kil, | 대한금속재료학회 | 2006 ,
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