본문

  1. Home
9 Results:AA:PARK JEA-GUN 0.109 sec.
RSS 
Multilingual
 การค้นหาขั้นสูง
 เดินทางมาถึงค้นหาวัสดุใหม่
พิมพ์ที่เลือก Select Export to Excel
1
Regular Paper : Nature of Surface and Bulk Defects Induced by Epitaxial Growth in Epitaxial Layer Transfer Wafers
Regular Paper : Nature of Surface and Bulk Defects Induced by Epitaxial Growth in Epitaxial Layer Transfer Wafers
Suk Goo Kim, | 한국전기전자재료학회 | 2005 ,
2
Effect of O₂ Plasma Treatment on Hole-Injection Enhancement for Organic Light-Emitting Devices with Transparent Au:Al Anodes
Effect of O₂ Plasma Treatment on Hole-Injection Enhancement for Organic Light-Emitting Devices with Transparent Au:Al Anodes
Su Hwan Lee, | 한국물리학회 | 2007 ,
3
Characteristics of Dual Emission Using a Thin Semi-Transparent Au Cathode for Organic Light-Emitting Devices
Characteristics of Dual Emission Using a Thin Semi-Transparent Au Cathode for Organic Light-Emitting Devices
Yoon Ho Kang, | 한국물리학회 | 2007 ,
4
Post-RTA Effect on the Electrical Characteristics of Nano-Scale Strained Si Grown on SiGe-on-Insulator n-MOSFET
Post-RTA Effect on the Electrical Characteristics of Nano-Scale Strained Si Grown on SiGe-on-Insulator n-MOSFET
Seong-Je Kim, | 한국물리학회 | 2007 ,
5
Effect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxy1-Ethy1-Cellulose Concentration in a silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Kyu-Chul Cho, | 한국물리학회 | 2006 ,
6
Effects of the Size and the Concentration of the Abrasive in a Colloidal Silica (SiO2) Slurry with Added TMAH on Removal Selectivity of Polysilicon and Oxide Films in Polysilicon Chemical Mechanical Polishing
Effects of the Size and the Concentration of the Abrasive in a Colloidal Silica (SiO2) Slurry with Added TMAH on Removal Selectivity of Polysilicon and Oxide Films in Polysilicon Chemical Mechanical Polishing
Kyung-Woong Park, | 한국물리학회 | 2007 ,
7
Organic Bi-Stable Device Fabricated with a Sandwich Structure of Al / AIDCN / Al Nano-Crystals Surrounded by Amorphous Al??O?? /AIDCN / Al
Organic Bi-Stable Device Fabricated with a Sandwich Structure of Al / AIDCN / Al Nano-Crystals Surrounded by Amorphous Al??O?? /AIDCN / Al
Jea-gun Park., | 한국물리학회 | 2006 ,
8
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Cho, Kyu-chul, | 한국물리학회 | 2006 ,
9
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Cho Kyu-Chul, | 한국재료학회 | 2006 ,
처음1마지막