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Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
상세정보
- 자료유형
- 기사
- ISSN
- 12250562
- 서명/저자
- Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing / Kyu-Chul Cho, Hyeongtag Jeon, Jea-Gun Park 저.
- 발행사항
- 서울 : 한국재료학회, 2006.
- 형태사항
- pp. 308-311
- 키워드
- DEPENDENCE NANOTOPOGRAPHY IMPACT FUMED SILICA CERIA SLURRY ADDED SURFACTANT SHALLOW TRENCH ISOLATION CHEMICAL MECHANICAL POLISHING
- 기타저자
- Cho Kyu-Chul
- 기타저자
- Jeon Hyeongtag
- 기타저자
- Park Jea-Gun
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60077983
MARC
008060912s2006 ULKa a KOR■022 ▼a12250562
■245 ▼aDependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing▼dKyu-Chul Cho, Hyeongtag Jeon, Jea-Gun Park 저.
■260 ▼a서울▼b한국재료학회▼c2006.
■300 ▼app. 308-311
■653 ▼aDEPENDENCE▼aNANOTOPOGRAPHY▼aIMPACT▼aFUMED▼aSILICA▼aCERIA▼aSLURRY▼aADDED▼aSURFACTANT▼aSHALLOW▼aTRENCH▼aISOLATION▼aCHEMICAL▼aMECHANICAL▼aPOLISHING
■700 ▼aCho Kyu-Chul
■700 ▼aJeon Hyeongtag
■700 ▼aPark Jea-Gun
■773 ▼t한국재료학회지(Korean Journal of Materials Research)▼gVol. 16, No. 5, (2006 May)▼d2006, 05
■URL ▼ahttp://mrs-k.or.kr
■SIS ▼aS027076▼b60055267▼h8▼s2
