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1
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Chemical Mechanical Polishing Characteristics of Barium Titanate Thin Films Using Mixed Abrasive Slurry
Yong-jin Seo., | 한국물리학회 | 2006 ,
2
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Cho, Kyu-chul, | 한국물리학회 | 2006 ,
3
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Cho Kyu-Chul, | 한국재료학회 | 2006 ,
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