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601
Properties of In₂O₃-SnO₂Thin Films due to the Cathode Condition in the DC Magnetron Sputtering Process
Properties of In₂O₃-SnO₂Thin Films due to the Cathode Condition in the DC Magnetron Sputtering Process
S.-W. Ryu, | 한국물리학회 | 2007 ,
602
Mechanical Test of Stacked 4×4 CICC for the KSTAR Central Solenoid
Mechanical Test of Stacked 4×4 CICC for the KSTAR Central Solenoid
H. K. Kim, | 한국물리학회 | 2006 ,
603
Key Features in the Assembly of the KSTAR TF Magnets
Key Features in the Assembly of the KSTAR TF Magnets
K. M. Kim, | 한국물리학회 | 2006 ,
604
Status of the KSTAR Tokamak Construction and Assembly
Status of the KSTAR Tokamak Construction and Assembly
Y. K. Oh, | 한국물리학회 | 2006 ,
605
Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid Thermal Annealing Conditions
Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid Thermal Annealing Conditions
A. R. Choi, | 한국물리학회 | 2007 ,
606
Crystallization Process and Mixed Alkali Effect in Lithium-Potassium Borate Glass
Crystallization Process and Mixed Alkali Effect in Lithium-Potassium Borate Glass
M. Kim, | 한국물리학회 | 2007 ,
607
Dielectric Properties of Amorphous KNbXO5(X=Ge, Si)
Dielectric Properties of Amorphous KNbXO5(X=Ge, Si)
Chul Ho Song, | 한국물리학회 | 2007 ,
608
Novel Ashing Process of Heavily Implanted Photoresist
Novel Ashing Process of Heavily Implanted Photoresist
Se-Geun Park, | 한국물리학회 | 2007 ,
609
Effects of Process Parameter for LiNbO₃ Optical Waveguide Prepared by Neutral Loop Discharge Plasma Etching
Effects of Process Parameter for LiNbO₃ Optical Waveguide Prepared by Neutral Loop Discharge Plasma Etching
W. J. Park, | 한국물리학회 | 2006 ,
610
이탈리아요리 용어사전
이탈리아요리 용어사전
진양호, 594.5403-진63'이-R | 현학사 | 2004 594.5403-진63'이-R,
처음이전56575859606162636465이후마지막