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Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid Thermal Annealing Conditions
Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid...
Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid Thermal Annealing Conditions

Detailed Information

자료유형  
 기사
ISSN  
03744884
저자명  
A. R. Choi
서명/저자  
Nickel-Based Germanosilicide of n+-Si0.83Ge0.17For Various Doping Concentrations and Rapid Thermal Annealing Conditions / A. R. Choi , S. S. Choi , J. H. Kim , H. D. Yang , J. W. Yang , J. Y. Kim , K. H. Shim , S. H. Kim , S. H. Lee , J. L. Lee
발행사항  
서울 : 한국물리학회, 2007.
형태사항  
pp. S800-S806
기타저자  
S. S. Choi
기타저자  
J. H. Kim
기타저자  
H. D. Yang
기타저자  
J. W. Yang
기타저자  
J. Y. Kim
기타저자  
K. H. Shim
기타저자  
S. H. Kim
기타저자  
S. H. Lee
기타저자  
J. L. Lee
기본자료저록  
Journal of The Korean Physical Society : Vol. 49 supplementary isssu III.(2006.12) 2007, 01
모체레코드  
모체정보확인
Control Number  
kjul:60145411

MARC

 008101018s2007        ulka    a                          eng
■022    ▼a03744884
■1001  ▼aA.  R.  Choi
■24510▼aNickel-Based  Germanosilicide  of  n+-Si0.83Ge0.17For  Various  Doping  Concentrations  and  Rapid  Thermal  Annealing  Conditions▼dA.  R.  Choi▼eS.  S.  Choi▼eJ.  H.  Kim▼eH.  D.  Yang▼eJ.  W.  Yang▼eJ.  Y.  Kim▼eK.  H.  Shim▼eS.  H.  Kim▼eS.  H.  Lee▼eJ.  L.  Lee
■260    ▼a서울▼b한국물리학회▼c2007.
■300    ▼app.  S800-S806
■7001  ▼aS.  S.  Choi
■7001  ▼aJ.  H.  Kim
■7001  ▼aH.  D.  Yang
■7001  ▼aJ.  W.  Yang
■7001  ▼aJ.  Y.  Kim
■7001  ▼aK.  H.  Shim
■7001  ▼aS.  H.  Kim
■7001  ▼aS.  H.  Lee
■7001  ▼aJ.  L.  Lee
■773    ▼tJournal  of  The  Korean  Physical  Society▼gVol.  49  supplementary  isssu  III.(2006.12)▼d2007,  01
■SIS    ▼aS036912▼b60077342▼h8▼s2▼fP

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