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31
Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications
Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications
Hyoungsub Kim, | 한국물리학회 | 2006 ,
32
Well-Width Dependence of the Threshold Current Density of Type-Ⅱ GaAsSb/GaAs Quantum Well Lasers
Well-Width Dependence of the Threshold Current Density of Type-Ⅱ GaAsSb/GaAs Quantum Well Lasers
Kim, Jong-jae, | 한국물리학회 | 2006 ,
33
A Highly Stable Quartz Crystal Microbalance Sensor and Its Application to Water Vapor Measurements
A Highly Stable Quartz Crystal Microbalance Sensor and Its Application to Water Vapor Measurements
Kwon, Su Yong, | 한국물리학회 | 2006 ,
34
Condensate Wave Function of Neutral Bose Atoms in Power-Law Traps
Condensate Wave Function of Neutral Bose Atoms in Power-Law Traps
Kim, Sang-hoon, | 한국물리학회 | 2006 ,
35
Cylindrical Waves and Faraday Rotation in the Einstein-Maxwell Theory
Cylindrical Waves and Faraday Rotation in the Einstein-Maxwell Theory
Park, D. H., | 한국물리학회 | 2006 ,
36
Modified Korteweg-de Vries Theory of Monotonic Double Jayers in Plasmas with Negative Ions
Modified Korteweg-de Vries Theory of Monotonic Double Jayers in Plasmas with Negative Ions
Kim, Tae-han, | 한국물리학회 | 2006 ,
37
Blending MEH-PPV Conjugate Polymers with Single-Walled Carbon Nanotubes for Polymer Light-Emitting Diodes
Blending MEH-PPV Conjugate Polymers with Single-Walled Carbon Nanotubes for Polymer Light-Emitting Diodes
Lee, Sung Pyo, | 한국물리학회 | 2006 ,
38
The Effect of the Partial Pressure of H₂ Gas and Atomic Hydrogen on Diamond Films Deposited Using CH₃OH/H₂O Gas
The Effect of the Partial Pressure of H₂ Gas and Atomic Hydrogen on Diamond Films Deposited Using CH₃OH/H₂O Gas
Lee, Kwon-jai, | 한국물리학회 | 2006 ,
39
Barrier-Width Effects on Electronic and Optical Properties of type-Ⅱ GaAsSb/GaAs/AlGaAs Quantum-Well Lasers
Barrier-Width Effects on Electronic and Optical Properties of type-Ⅱ GaAsSb/GaAs/AlGaAs Quantum-Well Lasers
Park, Seoung-hwan Park,, | 한국물리학회 | 2006 ,
40
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Koo, Jaehyoung, | 한국물리학회 | 2006 ,
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