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31
Effects of Sn on the Oxidation and Oxide Characteristics of Zr Alloys in Water and a LiOH Solution
Effects of Sn on the Oxidation and Oxide Characteristics of Zr Alloys in Water and a LiOH Solution
Yong Hwan Jeong, Jun-Hwan Kim, Hyun-gil Kim, | 대한금속.재료학회 | 2004 ,
32
Buffered Oxide Etch 세정에 의한 다결정 실리콘 TFT의 전기적 특성 개선
Buffered Oxide Etch 세정에 의한 다결정 실리콘 TFT의 전기적 특성 개선
남영묵, 배성찬, 최시영, | 대한전자공학회 | 2004 ,
33
Oxide층의 두께와 위치 조절을 통한 oxide-VCSEL의 단일모드 동작반경 확장
Oxide층의 두께와 위치 조절을 통한 oxide-VCSEL의 단일모드 동작반경 확장
김남길, 김상배, | 대한전자공학회 | 2004 ,
34
Characterization of Oxide Scales Formed on HVOF-Sprayed NiCoCrAlY+(Re,Ta) Coatings
Characterization of Oxide Scales Formed on HVOF-Sprayed NiCoCrAlY+(Re,Ta) Coatings
J. H. Ko, J. H. Lee, D. B. Lee, | 대한금속.재료학회 | 2004 ,
35
대기압 저온 플라스마에 의한 ITO(Indium Tin Oxide)박막 식각의 수소(H₂)효과
대기압 저온 플라스마에 의한 ITO(Indium Tin Oxide)박막 식각의 수소(H₂)효과
이봉주, | 대한전자공학회 | 2002 ,
36
MOS (metal oxide semiconductor) physics and technology
MOS (metal oxide semiconductor) physics and technology
Nicollian, E. H., 569.8-N646m | Wiley-Interscience | 2003 569.8-N646m,
37
Separation of Oxide Inclusions from Liguid Metal in an Applied Electrostatic Field
Separation of Oxide Inclusions from Liguid Metal in an Applied Electrostatic Field
Jae H Kim,Jung M Lee,Ho C Shin,Young H Paik, | 대한금속.재료학회 | 2003 ,
38
The Relationship Between Firing Modes and Nitric Oxide Emission in Highly Preheated Air Combustion
The Relationship Between Firing Modes and Nitric Oxide Emission in Highly Preheated Air Combustion
Gyung-Min Choi,Masahi Katsuki, | 대한기계학회 | 2000 ,
39
Growth and Characterizationof Al₂O₃Thin Films for the Buffer Insulator in Pt/SrBi₂Nb₂O0/Al₂O₃/Si Ferroelectric Gate Oxide Structure
Growth and Characterizationof Al₂O₃Thin Films for the Buffer Insulator in Pt/SrBi₂Nb₂O0/Al₂O₃/Si Ferroelectric Gate Oxide Structure
Hoon Sang Choi,Geun-Sik Lim,Jong Han Lee, | 대한금속.재료학회 | 2003 ,
40
Phase Change Induced Dgradationof Amophous Vanadium Oxide Cathode Thin Film During Charge-Discharge
Phase Change Induced Dgradationof Amophous Vanadium Oxide Cathode Thin Film During Charge-Discharge
H.Y.Park,S.R.Lee,W.I.Cho, | 대한금속.재료학회 | 2003 ,
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