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311
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
312
Effect of NH₃Pretreatment on the Surface Morphologies of GaN Films Grown on Miscut Sapphire Substrates by Using Hydride Vapor Phase Epitaxy
Effect of NH₃Pretreatment on the Surface Morphologies of GaN Films Grown on Miscut Sapphire Substrates by Using Hydride Vapor Phase Epitaxy
Sanghwa Lee, | 한국물리학회 | 2007 ,
313
Electron-Electron Interactions in a Two-dimensional Electron Systemin an Al0.15Ga0.85N/GaN Heterostructure Grown on Ρ-Type Si
Electron-Electron Interactions in a Two-dimensional Electron Systemin an Al0.15Ga0.85N/GaN Heterostructure Grown on Ρ-Type Si
Jian-Zhe Huang, | 한국물리학회 | 2007 ,
314
Etching of silicon Substrates by Using a Plasmatron
Etching of silicon Substrates by Using a Plasmatron
Vadim Yu Plaksin, | 한국물리학회 | 2007 ,
315
Charge Density Distribution of PbHfO₃in Antiferroelectric Phase
Charge Density Distribution of PbHfO₃in Antiferroelectric Phase
Yoshihiro Terado, | 한국물리학회 | 2007 ,
316
Quantum Simulation of Coaxially Gated CNTFETs by Using an Effective Mass Approach
Quantum Simulation of Coaxially Gated CNTFETs by Using an Effective Mass Approach
Chiyui Ahn, | 한국물리학회 | 2007 ,
317
An Improved Symmetrically-Graded Doped-Channel Heterostructure field-Effect Transistor
An Improved Symmetrically-Graded Doped-Channel Heterostructure field-Effect Transistor
Ke-Hua su, | 한국물리학회 | 2007 ,
318
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Seung Hyung Kim, | 한국물리학회 | 2007 ,
319
Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Anvar Sagatovich Zakirov, | 한국물리학회 | 2007 ,
320
Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Rangaswamy Navamathavan, | 한국물리학회 | 2007 ,
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