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Etching of silicon Substrates by Using a Plasmatron
Etching of silicon Substrates by Using a Plasmatron
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Vadim Yu Plaksin
- 서명/저자
- Etching of silicon Substrates by Using a Plasmatron / Vadim Yu Plaksin , Sang beon Joa , Heon Ju Lee , Chi Kyu Choi
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 723-727
- 기타저자
- Sang beon Joa
- 기타저자
- Heon Ju Lee
- 기타저자
- Chi Kyu Choi
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60147398
MARC
008101203s2007 ulka a eng■022 ▼a03744884
■1001 ▼aVadim Yu Plaksin
■24510▼aEtching of silicon Substrates by Using a Plasmatron▼dVadim Yu Plaksin▼eSang beon Joa▼eHeon Ju Lee▼eChi Kyu Choi
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 723-727
■7001 ▼aSang beon Joa
■7001 ▼aHeon Ju Lee
■7001 ▼aChi Kyu Choi
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 3 (2007. 3)▼d2007, 03
■SIS ▼aS037722▼b60077342▼h8▼s2▼fP
