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1
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-, | 한국화학공학회 | 2001 ,
2
Physicochemical Characteristics of Waste Sea Shells for Acid Gas Cleaning Absorbent
Physicochemical Characteristics of Waste Sea Shells for Acid Gas Cleaning Absorbent
Jong Hyeon Jung, Byung Hyun Shon, Kyung Sun Yoo,, | 한국화학공학회 | 2000 ,
3
Effect of Rinsing and Drying on Silicon Surface Cleaning for Epitaxial Growth
Effect of Rinsing and Drying on Silicon Surface Cleaning for Epitaxial Growth
Hyoun Woo Kim,Kwang-Sik Kim, | 대한금속.재료학회 | 2002 ,
4
Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
Hyoun-Woo Kim,Kwang-Sik Kim, | 대한금속.재료학회 | 2002 ,
5
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Kwang-sik Kim,Hyoun-woo Kim, | 대한금속.재료학회 | 2001 ,
6
The Confirmation Mess : Cleaning up the Federal Appointments Process
The Confirmation Mess : Cleaning up the Federal Appointments Process
Carter, Stephen L, 334-C323c | Basic Books | 1994 334-C323c,
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1
Semiconductor Wafor Cleaning and Surface Characterization
대한금속재료학회(구 대한금속학회) [기계공학, ]