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1
Patterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids
Patterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids
K. K. Chattopadhyay., | 한국물리학회 | 2006 ,
2
Role of Chlorine in the Ovidation Resistance of Ti-45at.% Al-1.6at.%Mn Intermetallic Compound
Role of Chlorine in the Ovidation Resistance of Ti-45at.% Al-1.6at.%Mn Intermetallic Compound
Young-Jin Kim,Ik-Beom Kim,Jeong-Whan Han, | 대한금속.재료학회 | 2000 ,
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