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Patterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids
Patterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Patterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids / K. K. Chattopadhyay , Jongkyu Cho , Jihoon Kwak , Jaisun Kyoung , Okkyung Kim , Ilsin An.
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 1273-1276
- 기타저자
- Jongkyu Cho
- 기타저자
- Jihoon Kwak
- 기타저자
- Jaisun Kyoung
- 기타저자
- Okkyung Kim
- 기타저자
- Ilsin An.
- Control Number
- kjul:60096930
MARC
008070412s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aK. K. Chattopadhyay.
■245 ▼aPatterning of Thin Copper Films Under UV Exposure in Chlorine-Based Liquids ▼dK. K. Chattopadhyay▼eJongkyu Cho▼eJihoon Kwak▼eJaisun Kyoung▼eOkkyung Kim▼eIlsin An.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1273-1276
■653 ▼aPATTERNING▼aCOPPER▼aFILMS▼aUV▼aEXPOSURE▼aCHLORINEBASED▼aLIQUIDS
■7001 ▼aJongkyu Cho
■7001 ▼aJihoon Kwak
■7001 ▼aJaisun Kyoung
■7001 ▼aOkkyung Kim
■7001 ▼aIlsin An.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■■URL ▼ahttp://www.kps.or.kr
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