본문

  1. Home
57 Results:AA:LEE SANG WOO 0.205 sec.
RSS 
Multilingual
 Recherche avancée
 nouvelle arrivée Rechercher
impression sélectionné Select Export to Excel
1
Hepatopotective Effects of Black Rice on Superoxide Anion Radicals in HepG2 Cells
Hepatopotective Effects of Black Rice on Superoxide Anion Radicals in HepG2 Cells
Sangin Shim, | 한국식품과학회 | 2006 ,
2
Germination Effect of Soybean on Its Contents of Isoflavones and Oligosaccharides
Germination Effect of Soybean on Its Contents of Isoflavones and Oligosaccharides
Woo Jung Kim, | 한국식품과학회 | 2005 ,
3
The Protective Effects of Isoflavone Extracted from Soybean Paste in Free Radical Initiator Treated Rats
The Protective Effects of Isoflavone Extracted from Soybean Paste in Free Radical Initiator Treated Rats
Hye Young Nam, | 한국식품과학회 | 2005 ,
4
Immunomodulating Activity of Pectic Polysaccharides from Eleutherococcus senticosus
Immunomodulating Activity of Pectic Polysaccharides from Eleutherococcus senticosus
Taek Joon Yoon, | 한국식품과학회 | 2003 ,
5
Radiation Sensitivity of Aspergillus flavus in Semi-dried Beef Jerky
Radiation Sensitivity of Aspergillus flavus in Semi-dried Beef Jerky
Ju Woon Lee, | 한국식품과학회 | 2003 ,
6
Isoflavone Content and Estrogen Activity in Arrowroot Puerariae Radix
Isoflavone Content and Estrogen Activity in Arrowroot Puerariae Radix
Hee Yun Kim, | 한국식품과학회 | 2003 ,
7
Development of Functional Beverage Using Deer Antler Extract and Its Physiological Activity
Development of Functional Beverage Using Deer Antler Extract and Its Physiological Activity
Bong Jeun An, | 한국식품과학회 | 2002 ,
8
Device characterization and Fabrication Issues for Ferroelectric Gate Field Effect Transistor Device
Device characterization and Fabrication Issues for Ferroelectric Gate Field Effect Transistor Device
Yu , Byoung-Gon, | 대한전자공학회 | 2002 ,
9
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Thermal Stability and Electrical Properties of HfOxNy, Gate Dielectrics with TaN Gate Electrode
Jeon Ho Kim, | 한국전기전자재료학회 | 2004 ,
10
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
처음123456이후마지막