본문

  1. Home
18 Results:AA:CHI KYU CHOI 0.140 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
1
The Protective Effects of Isoflavone Extracted from Soybean Paste in Free Radical Initiator Treated Rats
The Protective Effects of Isoflavone Extracted from Soybean Paste in Free Radical Initiator Treated Rats
Hye Young Nam, | 한국식품과학회 | 2005 ,
2
Study on Electrochemical Properties of TBT(Tributyltin)
Study on Electrochemical Properties of TBT(Tributyltin)
Chil Nam Choi, | The Korean Environmental Sciences Societ | 2001 ,
3
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
A Study of the Electrical Properties at the Interface in MIS Structure with Low-Dielectric-Constant SiOC(-H) Films Deposited by Using UV-Source -Assisted PECVD
Chang Young Kim, | 한국물리학회 | 2007 ,
4
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
Chang Young Kim, | 한국물리학회 | 2007 ,
5
Etching of silicon Substrates by Using a Plasmatron
Etching of silicon Substrates by Using a Plasmatron
Vadim Yu Plaksin, | 한국물리학회 | 2007 ,
6
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Low-Dielectric-Constant SiOC(-H) Films Prepared from DMDMS and O₂ Precursors by Using Plasma Enhanced Chemical Vapor Deposition
Seung Hyung Kim, | 한국물리학회 | 2007 ,
7
Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Comparative Study on the Structural and Electrical Properties of Low-k SiOC(-H) Films Deposited by Using Plasma Enhanced Chemical Bapor Deposition
Anvar Sagatovich Zakirov, | 한국물리학회 | 2007 ,
8
Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Rangaswamy Navamathavan, | 한국물리학회 | 2007 ,
9
Electro-Physical Properties of a Si-Based MIS Structure with a Low-Bftextitk SiOC(-H) Film
Electro-Physical Properties of a Si-Based MIS Structure with a Low-Bftextitk SiOC(-H) Film
Anvar Sagatovich Zakirov, | 한국물리학회 | 2006 ,
10
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
처음12이후마지막