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81
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
82
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
83
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
84
X-ray Response Characteristic of Zn in the Polycrystalline Cd1-xZnxTe Detector for Digital Radiography
X-ray Response Characteristic of Zn in the Polycrystalline Cd1-xZnxTe Detector for Digital Radiography
Sang Sik Kang, | 한국전기전자재료학회 | 2003 ,
85
Regular paper : Current - Voltage - Luminance Characteristics Depending on a Direction of Applied Voltage in Organic Light - Emitting Diodes
Regular paper : Current - Voltage - Luminance Characteristics Depending on a Direction of Applied Voltage in Organic Light - Emitting Diodes
Sang Keol Kim, | 한국전기전자재료학회 | 2003 ,
86
Regular paper : Electrical Properties of Organic / Inorganic Hybrid Composites for Insulation Materials
Regular paper : Electrical Properties of Organic / Inorganic Hybrid Composites for Insulation Materials
Sang Cheol Kim, | 한국전기전자재료학회 | 2003 ,
87
Regular paper : Fabrication of Field - Emitter Arrays using the Mold Method for FED Applications
Regular paper : Fabrication of Field - Emitter Arrays using the Mold Method for FED Applications
Kyung Jea Cho, | 한국전기전자재료학회 | 2003 ,
88
Regular Paper : The Mg Solid Solution for the P - type Activation of GaN Thin Films Grown by Metal - Organic Chemical Vapor Deposition
Regular Paper : The Mg Solid Solution for the P - type Activation of GaN Thin Films Grown by Metal - Organic Chemical Vapor Deposition
Keun Joo Kim, | 한국전기전자재료학회 | 2002 ,
89
A Study on Characterization and Modeling of Shallow Trench Isolation in Oxide Chemical Mechanical Polishing
A Study on Characterization and Modeling of Shallow Trench Isolation in Oxide Chemical Mechanical Polishing
Sang Yong Kim, | 한국전기전자재료학회 | 2002 ,
90
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Gwiy Sang Chung, | 한국전기전자재료학회 | 2002 ,
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