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351
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
352
Improvement of Mchanical Property of Indium - tin - oxide Films on Polymer Substrates by using Organic Buffer Layer
Improvement of Mchanical Property of Indium - tin - oxide Films on Polymer Substrates by using Organic Buffer Layer
Jeong In Han, | 한국전기전자재료학회 | 2003 ,
353
Regular paper : Fabrication Technology of the Focusing Grating Coupler using Single - step Electron Beam Lithography
Regular paper : Fabrication Technology of the Focusing Grating Coupler using Single - step Electron Beam Lithography
Tae Youb Kim, | 한국전기전자재료학회 | 2003 ,
354
Regular Paper : A New SOI LIGBT Structure with Improved Latch - Up Performance
Regular Paper : A New SOI LIGBT Structure with Improved Latch - Up Performance
Woong Je Sung, | 한국전기전자재료학회 | 2002 ,
355
Regular Paper : A Small Scaling Lateral Trench IGBT with Improved Electrical Characteristics for Smart Power IC
Regular Paper : A Small Scaling Lateral Trench IGBT with Improved Electrical Characteristics for Smart Power IC
Seung Hyun Moon, | 한국전기전자재료학회 | 2002 ,
356
A Novel EST with Trench Electrode to Immunize snab - back Effect and to Obtain High Blocking Voltage
A Novel EST with Trench Electrode to Immunize snab - back Effect and to Obtain High Blocking Voltage
Ey Goo Kang, | 한국전기전자재료학회 | 2002 ,
357
Microstructural and Piezoelectric Characteristics of PSN - PMN - PZT Ceramics Produced by Attrition Milling
Microstructural and Piezoelectric Characteristics of PSN - PMN - PZT Ceramics Produced by Attrition Milling
Ju Hyun Yoo, | 한국전기전자재료학회 | 2002 ,
358
Regular Paper : Photo Catalytic Ability of Acicular Shaped TiO2 Rutile Powder in Aqueous Metal - EDTA Solutions
Regular Paper : Photo Catalytic Ability of Acicular Shaped TiO2 Rutile Powder in Aqueous Metal - EDTA Solutions
Sun Jae Kim, | 한국전기전자재료학회 | 2002 ,
359
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Gwiy Sang Chung, | 한국전기전자재료학회 | 2002 ,
360
Regular Paper : The Effect of Pyrazine on TMAH : IPA Single - crystal Silicon Anisotropic Etching Properties
Regular Paper : The Effect of Pyrazine on TMAH : IPA Single - crystal Silicon Anisotropic Etching Properties
Gwiy Sang Chung, | 한국전기전자재료학회 | 2002 ,
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