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341
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Reduction of Plasma Process Induced Damage during HDP IMD Deposition
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
342
Improvement of Mchanical Property of Indium - tin - oxide Films on Polymer Substrates by using Organic Buffer Layer
Improvement of Mchanical Property of Indium - tin - oxide Films on Polymer Substrates by using Organic Buffer Layer
Jeong In Han, | 한국전기전자재료학회 | 2003 ,
343
Regular paper : Fabrication Technology of the Focusing Grating Coupler using Single - step Electron Beam Lithography
Regular paper : Fabrication Technology of the Focusing Grating Coupler using Single - step Electron Beam Lithography
Tae Youb Kim, | 한국전기전자재료학회 | 2003 ,
344
Regular Paper : A New SOI LIGBT Structure with Improved Latch - Up Performance
Regular Paper : A New SOI LIGBT Structure with Improved Latch - Up Performance
Woong Je Sung, | 한국전기전자재료학회 | 2002 ,
345
Regular Paper : A Small Scaling Lateral Trench IGBT with Improved Electrical Characteristics for Smart Power IC
Regular Paper : A Small Scaling Lateral Trench IGBT with Improved Electrical Characteristics for Smart Power IC
Seung Hyun Moon, | 한국전기전자재료학회 | 2002 ,
346
A Novel EST with Trench Electrode to Immunize snab - back Effect and to Obtain High Blocking Voltage
A Novel EST with Trench Electrode to Immunize snab - back Effect and to Obtain High Blocking Voltage
Ey Goo Kang, | 한국전기전자재료학회 | 2002 ,
347
Microstructural and Piezoelectric Characteristics of PSN - PMN - PZT Ceramics Produced by Attrition Milling
Microstructural and Piezoelectric Characteristics of PSN - PMN - PZT Ceramics Produced by Attrition Milling
Ju Hyun Yoo, | 한국전기전자재료학회 | 2002 ,
348
Regular Paper : Photo Catalytic Ability of Acicular Shaped TiO2 Rutile Powder in Aqueous Metal - EDTA Solutions
Regular Paper : Photo Catalytic Ability of Acicular Shaped TiO2 Rutile Powder in Aqueous Metal - EDTA Solutions
Sun Jae Kim, | 한국전기전자재료학회 | 2002 ,
349
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Regular Paper : Electrochemical Etch - Stop Suitable for MEMS Applications
Gwiy Sang Chung, | 한국전기전자재료학회 | 2002 ,
350
Regular Paper : The Effect of Pyrazine on TMAH : IPA Single - crystal Silicon Anisotropic Etching Properties
Regular Paper : The Effect of Pyrazine on TMAH : IPA Single - crystal Silicon Anisotropic Etching Properties
Gwiy Sang Chung, | 한국전기전자재료학회 | 2002 ,
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