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29 Results:UU:VOL49SUPPLEMENTARYISSSUIII200612 0.62 sec.
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21
Selective Vapor Deposition of Poly(3,4-Ethylenedioxythiophene) ThinFilm on an n-Octadecyltrichlorosilane Monolayer Oxidized by Ultraviolet Photolithography
Selective Vapor Deposition of Poly(3,4-Ethylenedioxythiophene) ThinFilm on an n-Octadecyltrichlorosilane Monolayer Oxidized by Ultraviolet Photolithography
S. Kim, | 한국물리학회 | 2007 ,
22
Novel Ashing Process of Heavily Implanted Photoresist
Novel Ashing Process of Heavily Implanted Photoresist
Se-Geun Park, | 한국물리학회 | 2007 ,
23
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
Seok-Hwan Lee, | 한국물리학회 | 2007 ,
24
Study of a Thin Al₂O₃/TaN Absorber Stack on Ru-Capped Multilayers
Study of a Thin Al₂O₃/TaN Absorber Stack on Ru-Capped Multilayers
Tae Geun Kim, | 한국물리학회 | 2007 ,
25
Fabrication of Two-Dimensional Periodic Structures in an Amorphous Silicon Film by Four-Beam Interference Lithography
Fabrication of Two-Dimensional Periodic Structures in an Amorphous Silicon Film by Four-Beam Interference Lithography
Geon Joon Lee, | 한국물리학회 | 2007 ,
26
Sub-60-nm Lithography Patterns by Low-Energy Microcolumn Lithography
Sub-60-nm Lithography Patterns by Low-Energy Microcolumn Lithography
H. S. Kim, | 한국물리학회 | 2007 ,
27
An Analysis of Boundary Effects of Regionally Applied Modified Illumination with DOE at the Back Surface of a Photomask
An Analysis of Boundary Effects of Regionally Applied Modified Illumination with DOE at the Back Surface of a Photomask
Woo-Jung Kim, | 한국물리학회 | 2007 ,
28
Thermal Stability and Adhesion Improvement of Cu(Ag)/Mo Bilayer Metallization in Large-Area TFT-LCDs
Thermal Stability and Adhesion Improvement of Cu(Ag)/Mo Bilayer Metallization in Large-Area TFT-LCDs
H. M. Lee, | 한국물리학회 | 2007 ,
29
Deposition Characteristics of Co Thin Films over High Aspect Ratio Trenches by MOCVD Using CO₂(CO)8 as a Precursor
Deposition Characteristics of Co Thin Films over High Aspect Ratio Trenches by MOCVD Using CO₂(CO)8 as a Precursor
J. Lee, | 한국물리학회 | 2007 ,
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