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11
Deposition Characteristics of Low Dielectric Constant SiOF Films Prepared by ECR PECVD
Deposition Characteristics of Low Dielectric Constant SiOF Films Prepared by ECR PECVD
Kyung-Mun Byun,Won-Jong Lee, | 대한금속.재료학회 | 2000 ,
12
Constants in Some Inequalities of Analysis
Constants in Some Inequalities of Analysis
Mikhlim, Solomon G, 412.87-M636c | Wiley & Sons | 1986 412.87-M636c,
13
In Constant Flight
In Constant Flight
Tallent, Elizabeth, 843-T147c | Henry Holt and Company | 1987 843-T147c,
14
Computational Methods for the Determination of Formation Constants
Computational Methods for the Determination of Formation Constants
Leggett, David J, 005.119-L513c | Plenum | 1985 005.119-L513c,
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