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Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 서명/저자
- Deposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections / Rangaswamy Navamathavan , An Soo Jung , Hyun Seung Kim , Young Jun Jang , Chi Kyu Choi , Kwang-Man Lee
- 발행사항
- 서울 : 한국물리학회, 2007.
- 형태사항
- pp. 1803-1808
- 기타저자
- An Soo Jung
- 기타저자
- Hyun Seung Kim
- 기타저자
- Young Jun Jang
- 기타저자
- Chi Kyu Choi
- 기타저자
- Kwang-Man Lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60146094
MARC
008101028s2007 ulka a eng■022 ▼a03744884
■1001 ▼aRangaswamy Navamathavan
■24510▼aDeposition and Characterization of Low-dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections▼dRangaswamy Navamathavan▼eAn Soo Jung▼eHyun Seung Kim▼eYoung Jun Jang▼eChi Kyu Choi▼eKwang-Man Lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1803-1808
■7001 ▼aAn Soo Jung
■7001 ▼aHyun Seung Kim
■7001 ▼aYoung Jun Jang
■7001 ▼aChi Kyu Choi
■7001 ▼aKwang-Man Lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 50 No. 6 (2007. 6)▼d2007, 06
■SIS ▼aS040681▼b60077342▼h8▼s2▼fP
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