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Properties of the Ultra-Thin Silicon-Oxynitride Films Deposited by Using Plasma-Assisted N2O Oxidation for Semiconductor Device Applications
Properties of the Ultra-Thin Silicon-Oxynitride Films Deposited by Using Plasma-Assisted N2O Oxidation for Semiconductor Device Applications
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Sunghyun Hwang
- Title/Author
- Properties of the Ultra-Thin Silicon-Oxynitride Films Deposited by Using Plasma-Assisted N2O Oxidation for Semiconductor Device Applications / Sunghyun Hwang ; Sungwook Jung ; Kyung-Soo Jang ; Jeoung In Lee ; Hyungjun Park ; S.K.Dhungel ; J.Yi ; Ho-Kyoon Chung ; Byong-Deog Choi ; Ki-Young Lee
- Publish Info
- 서울 : 한국물리학회, 2007.
- Material Info
- pp. 1096-1099
- Added Entry-Personal Name
- Sungwook Jung
- Added Entry-Personal Name
- Kyung-Soo Jang
- Added Entry-Personal Name
- Jeoung In Lee
- Added Entry-Personal Name
- Hyungjun Park
- Added Entry-Personal Name
- S.K.Dhungel
- Added Entry-Personal Name
- J.Yi
- Added Entry-Personal Name
- Ho-Kyoon Chung
- Added Entry-Personal Name
- Byong-Deog Choi
- Added Entry-Personal Name
- Ki-Young Lee
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60141678
MARC
008100819s2007 ulka a eng■022 ▼a03744884
■1001 ▼aSunghyun Hwang
■24510▼aProperties of the Ultra-Thin Silicon-Oxynitride Films Deposited by Using Plasma-Assisted N2O Oxidation for Semiconductor Device Applications▼dSunghyun Hwang▼eSungwook Jung▼eKyung-Soo Jang▼eJeoung In Lee▼eHyungjun Park▼eS.K.Dhungel▼eJ.Yi▼eHo-Kyoon Chung▼eByong-Deog Choi▼eKi-Young Lee
■260 ▼a서울▼b한국물리학회▼c2007.
■300 ▼app. 1096-1099
■7001 ▼aSungwook Jung
■7001 ▼aKyung-Soo Jang
■7001 ▼aJeoung In Lee
■7001 ▼aHyungjun Park
■7001 ▼aS.K.Dhungel
■7001 ▼aJ.Yi
■7001 ▼aHo-Kyoon Chung
■7001 ▼aByong-Deog Choi
■7001 ▼aKi-Young Lee
■773 ▼tJournal of The Korean Physical Society▼gVol. 51 No. 3 (2007. 9)▼d2007, 09
■SIS ▼aS043255▼b60077342▼h8▼s2▼fP
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