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New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition f...
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot

Detailed Information

Material Type  
 기사
ISSN  
03744884
Author  
Kazunori Ichikawa.
Title/Author  
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot / Kazunori Ichikawa. ; Prakaipetch Punchaipetch ; Hiroshi Yano ; Tomoaki Hatayama ; Yukiharu Uraoka ; Takashi Fuyuki ; Atsushi Tomyo ; Eiji Takahashi ; Tsukasa Hayashi ; Kiyoshi Ogata.
Publish Info  
서울 : 한국물리학회, 2006.
Material Info  
pp. 569-576
Index Term-Uncontrolled  
NEW FABRICATION TECHNIQUE USING SIDEWALLTYPE PLASMAENHANCED CHEMICALVAPOR DEPOSITION FLOATING GATE MEMORY NANODOT
Added Entry-Personal Name  
Prakaipetch Punchaipetch
Added Entry-Personal Name  
Hiroshi Yano
Added Entry-Personal Name  
Tomoaki Hatayama
Added Entry-Personal Name  
Yukiharu Uraoka
Added Entry-Personal Name  
Takashi Fuyuki
Added Entry-Personal Name  
Atsushi Tomyo
Added Entry-Personal Name  
Eiji Takahashi
Added Entry-Personal Name  
Tsukasa Hayashi
Added Entry-Personal Name  
Kiyoshi Ogata.
Host Item Entry  
Journal of The Korean Physical Society : Vol. 49 No. 2 (2006. 8) 2006, 08
URL  
http://www.kps.or.kr
모체레코드  
모체정보확인
Control Number  
kjul:60097769

MARC

 008070418s2006        ULKa    a                          ENG
■022    ▼a03744884
■1001  ▼aKazunori  Ichikawa.
■245    ▼aNew  Fabrication  Technique  Using  Side-Wall-Type  Plasma-Enhanced  Chemical-Vapor  Deposition  for  a  Floating  Gate  Memory  with  a  Si  Nanodot                    ▼dKazunori  Ichikawa.            ▼ePrakaipetch  Punchaipetch▼eHiroshi  Yano▼eTomoaki  Hatayama▼eYukiharu  Uraoka▼eTakashi  Fuyuki▼eAtsushi  Tomyo▼eEiji  Takahashi▼eTsukasa  Hayashi▼eKiyoshi  Ogata.
■260    ▼a서울▼b한국물리학회▼c2006.
■300    ▼app.  569-576
■653    ▼aNEW▼aFABRICATION▼aTECHNIQUE▼aUSING▼aSIDEWALLTYPE▼aPLASMAENHANCED▼aCHEMICALVAPOR▼aDEPOSITION▼aFLOATING▼aGATE▼aMEMORY▼aNANODOT
■7001  ▼aPrakaipetch  Punchaipetch
■7001  ▼aHiroshi  Yano
■7001  ▼aTomoaki  Hatayama
■7001  ▼aYukiharu  Uraoka
■7001  ▼aTakashi  Fuyuki
■7001  ▼aAtsushi  Tomyo
■7001  ▼aEiji  Takahashi
■7001  ▼aTsukasa  Hayashi
■7001  ▼aKiyoshi  Ogata.
■773    ▼tJournal  of  The  Korean  Physical  Society▼gVol.  49  No.  2  (2006.  8)▼d2006,  08
■URL    ▼ahttp://www.kps.or.kr
■SIS    ▼aS028785▼b60077342▼h8▼s2

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