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Studies on Al₂O₃/ZrO₂/Al₂O₃High K Gate Dielectrics Applied in a Fully Depleted SOI MOSFET
Studies on Al₂O₃/ZrO₂/Al₂O₃High K Gate Dielectrics Applied in a Fully Depleted SOI MOSFET
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008050913s2004 ULKa a ENG■022 ▼a12259438
■245 ▼aStudies on Al₂O₃/ZrO₂/Al₂O₃High K Gate Dielectrics Applied in a Fully Depleted SOI MOSFET▼d공저 Chenglu Lin, Ninglin Zhang, Qinwo Shen
■260 ▼a서울▼b대한금속.재료학회▼c2004.
■300 ▼app. 475-478
■653 ▼aSTUDIES▼aAL₂O₃ZRO₂AL₂O₃HIGH▼aGATE▼aDIELECTRICS▼aAPPLIED▼aFULLY▼aDEPLETED▼aSOI▼aMOSFET
■700 ▼aChenglu Lin, Ninglin Zhang, Qinwo Shen
■773 ▼tMetals and Materials▼gVOL.10 NO.5 (2004 OCTOBER)▼d2004, 10
■SIS ▼aS010856▼b60013551▼h1▼s2▼fP


