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1
Regular Paper : Charging and Discharging Characteristics of Electric Double Layer Capacitors used for a Storage Battery of Solar Energy
Regular Paper : Charging and Discharging Characteristics of Electric Double Layer Capacitors used for a Storage Battery of Solar Energy
Youl Moon Sung, | 한국전기전자재료학회 | 2008 ,
2
Regular Paper : Electric-optical Characteristics of Backlight Unit with LED Light Source in Low Temperature Condition
Regular Paper : Electric-optical Characteristics of Backlight Unit with LED Light Source in Low Temperature Condition
Jeong Min Han, | 한국전기전자재료학회 | 2008 ,
3
Regular Paper : The Properties of CuInSe2 Thin Films by DC/RF Magnetron Sputtering and Thermal Evaporation Method
Regular Paper : The Properties of CuInSe2 Thin Films by DC/RF Magnetron Sputtering and Thermal Evaporation Method
Woon Jo Jeong, | 한국전기전자재료학회 | 2008 ,
4
Regular Paper : The Structural and Electrical Properties of Bismuth-based Pyrochlore Thin Films for embedded Capacitor Applications
Regular Paper : The Structural and Electrical Properties of Bismuth-based Pyrochlore Thin Films for embedded Capacitor Applications
Kyeong Chan Ahn, | 한국전기전자재료학회 | 2008 ,
5
Regular Paper : Physics of the Coefficient of Friction in CMP
Regular Paper : Physics of the Coefficient of Friction in CMP
Len Borucki, | 한국전기전자재료학회 | 2008 ,
6
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Regular Paper : Characterization of Silver Saturated-Ge45Te55 Solid Electrolyte Films Incorporated by Nitrogen for Programmable Metallization Cell Memory Device
Soo Jin Lee, | 한국전기전자재료학회 | 2008 ,
7
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Regular Paper : Thermal, Tribological, and Removal Rate Characteristics of Pad Conditioning in Copper CMP
Hyo Sang Lee, | 한국전기전자재료학회 | 2008 ,
8
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Regular Paper : Process Effect on the RMS Roughness of HfO2 Thin Films Grown by MOMBE
Young Don Ko, | 한국전기전자재료학회 | 2008 ,
9
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Regular Paper : Experimental and Numerical Analysis of A Novel Ceria Based Abrasive Slurry for Interlayer Dielectric Chemical Mechanical Planarization
Yun Zhuang, | 한국전기전자재료학회 | 2008 ,
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