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1
Self-Organized Process for Patterning of a Thin-Film Transistor
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-kwon Choo., | 한국물리학회 | 2006 ,
2
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
3
Effects of Hydrogen Annealing on the Thermoelectric Properties of Electrodeposited Bi₂Te₃ for Nanowire Applications
Effects of Hydrogen Annealing on the Thermoelectric Properties of Electrodeposited Bi₂Te₃ for Nanowire Applications
Sung-woo Jun., | 한국물리학회 | 2006 ,
4
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
5
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
6
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Acoustic Emission Source Analysis of Vacuum Plasma Sprayed CoNiCrAlY Coatings
Ku-hyun Lee., | 한국물리학회 | 2006 ,
7
Titania Nanofibers Srepared by Electrospinning
Titania Nanofibers Srepared by Electrospinning
Deuk Yong Lee., | 한국물리학회 | 2006 ,
8
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Kyoung Suk Oh., | 한국물리학회 | 2006 ,
9
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Studies of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using MTES/O₂-PECVD
Rangaswamy Navamathavan., | 한국물리학회 | 2006 ,
10
Novel Model for Film Formation in Plasma Processing
Novel Model for Film Formation in Plasma Processing
Leonid R. Shaginyan., | 한국물리학회 | 2006 ,
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