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8 Results:UU:VOL3NO42002DECEMBER PP:한국전기전자재료학회 0.120 sec.
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1
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Polar Anchoring Strength and Surface Ordering in NLC by the Washing Process on Rubbed Polymer Surfaces Containing Trifluoromethyl Moiety
Sang Keuk Lee, | 한국전기전자재료학회 | 2003 ,
2
TFD Device with Symmetrical Structure of Flexible Electrode Subject to Flexible Substrate
TFD Device with Symmetrical Structure of Flexible Electrode Subject to Flexible Substrate
Chan Jae Lee, | 한국전기전자재료학회 | 2003 ,
3
Fabrication of Novel Thin Film Diode with Multi-step Anodic Oxidation and Post Heat-treatment
Fabrication of Novel Thin Film Diode with Multi-step Anodic Oxidation and Post Heat-treatment
Sung Jei Hong, | 한국전기전자재료학회 | 2003 ,
4
Color Correction in Portable-type Urine Analyzer
Color Correction in Portable-type Urine Analyzer
Jae Hyung Kim, | 한국전기전자재료학회 | 2003 ,
5
Zinc Sulfide-selenium X-ray Detector for Digital Radiography
Zinc Sulfide-selenium X-ray Detector for Digital Radiography
Ji Koon Park, | 한국전기전자재료학회 | 2003 ,
6
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Surface Analysis of Plasma-treated PDMS by XPS and Surface Voltage Decay
Bok Hee Youn, | 한국전기전자재료학회 | 2003 ,
7
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
Reproducible Chemical Mechanical Polishing Characteristics of Shallow Trench Isolation Structure using High Selectivity Slurry
So Young Jeong, | 한국전기전자재료학회 | 2003 ,
8
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Failure Analysis for High via Resistance by HDP CVD System for IMD Layer
Sang Yong Kim, | 한국전기전자재료학회 | 2003 ,
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