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1
Duality in non-linear programming for limit analysis of not resisting tension bodies
Duality in non-linear programming for limit analysis of not resisting tension bodies
Baratta, A., | 국제구조공학회(TECNO-PRESS) | 2007 ,
2
Microstrip Square Open Loop와 Tunable Negative Resistance를 이용한 저위상 잡음 전압 제어 발진기
Microstrip Square Open Loop와 Tunable Negative Resistance를 이용한 저위상 잡음 전압 제어 발진기
이종민, | 한국전자파학회 | 2006 ,
3
서비스드 레지던스(serviced Residence)사업의 경영실태에 관한 연구
서비스드 레지던스(serviced Residence)사업의 경영실태에 관한 연구
현승범, | 관광경영학회 | 2006 ,
4
Curing Characteristics of Low Molar Ratio Urea-Formaldehyde Resins
Curing Characteristics of Low Molar Ratio Urea-Formaldehyde Resins
Fan Dongbin., | 한국접착 및 계면학회 | 2006 ,
5
Microstructures and Thermal Properties of Polycaprolactone/Epoxy Resin/SiO₂Hybrids
Microstructures and Thermal Properties of Polycaprolactone/Epoxy Resin/SiO₂Hybrids
He Lihua., | 한국접착 및 계면학회 | 2006 ,
6
Koch Fractal Shape Microstrip Bandpass Filters on High Resistivity Silicon for the Suppression of the 2nd Harmonic
Koch Fractal Shape Microstrip Bandpass Filters on High Resistivity Silicon for the Suppression of the 2nd Harmonic
Il Kwon Kim., | 한국전자파학회 | 2006 ,
7
Modeling for Resist reflow of an Elongated Contact Hole
Modeling for Resist reflow of an Elongated Contact Hole
Ji-eun Lee., | 한국물리학회 | 2006 ,
8
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
Residual Stress and Optical Properties in a Post-Annealed Ta₂O5/SiO₂ Multilayer Prepared by Using Dual-Ion-Beam Sputtering
S. G. Yoon., | 한국물리학회 | 2006 ,
9
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Simulator for the Design Considered Critical Dimension Bias in Resist Reflow Process
Sang-kon Kim., | 한국물리학회 | 2006 ,
10
Resistive Switching Characteristics of Unique Binary-Oxide MgOx Films
Resistive Switching Characteristics of Unique Binary-Oxide MgOx Films
Koo Woong Jeong., | 한국물리학회 | 2006 ,
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President Abraham Lincoln's Last Public Address
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