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1
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot
New Fabrication Technique Using Side-Wall-Type Plasma-Enhanced Chemical-Vapor Deposition for a Floating Gate Memory with a Si Nanodot
Kazunori Ichikawa., | 한국물리학회 | 2006 ,
2
Nonvolatile Memory Characteristics in Metal-Oxide-Semiconductors Containing Metal Nanoparticles Fabricated by Using a Unique Laser Irradiation Method
Nonvolatile Memory Characteristics in Metal-Oxide-Semiconductors Containing Metal Nanoparticles Fabricated by Using a Unique Laser Irradiation Method
Jungyup Yang., | 한국물리학회 | 2006 ,
3
Electroforming and Switching Properties of Binary-Oxide TiO₂ Thin Films for Nonvolatile Memory Applications
Electroforming and Switching Properties of Binary-Oxide TiO₂ Thin Films for Nonvolatile Memory Applications
Young Ho Do., | 한국물리학회 | 2006 ,
4
Nonvolatile Memory Properties of Thin Oxides with Single- and Multi-Layered Si Nanocrystals Obtained by Ion Beam Sputtering
Nonvolatile Memory Properties of Thin Oxides with Single- and Multi-Layered Si Nanocrystals Obtained by Ion Beam Sputtering
Kim, Sung, | 한국물리학회 | 2006 ,
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