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1
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
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Fabrication of Nanostructured Films of Block Copolymers for Nanolithographical Masks
Fabrication of Nanostructured Films of Block Copolymers for Nanolithographical Masks
Dae-Ho Park, Byeong-Hyeok Sohn, Jin Chul Jung, W, | 한국마이크로전자및 패키징학회 | 2005 ,
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