본문

  1. Home
13 Results:SS:ETCHING 0.93 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
1
Basic Study of the Electric Forces on a Glass Substrate in a Dry Etching System
Basic Study of the Electric Forces on a Glass Substrate in a Dry Etching System
Heehwan Choe., | 한국물리학회 | 2006 ,
2
Fault Detection of Reactive Ion Etching using time series Support Vector Machine
Fault Detection of Reactive Ion Etching using time series Support Vector Machine
박영국, | 한국해양정보통신학회 | 2006 ,
3
저에너지의 Ar중성빔을 이용한 Silicon의 Atomic Layer Etching
저에너지의 Ar중성빔을 이용한 Silicon의 Atomic Layer Etching
오창권, | 한국재료학회 | 2006 ,
4
Fabrication of a Probe Needle using a Tubular Cathode by Electrochemical Etching
Fabrication of a Probe Needle using a Tubular Cathode by Electrochemical Etching
Jae Wong Choi, Gil Ho Hwang, Sung Goon Kang, | Korean Institute of Metals and Materials | 2006 ,
5
Experimental Study on Spray Etching Process in Micro Fabrication of Lead Frame
Experimental Study on Spray Etching Process in Micro Fabrication of Lead Frame
Ji-Won Jung, Gyung-Min Choi, Duck-Jool Kim, | 대한기계학회 | 2004 ,
6
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
Yoon-Bong Hahn, Stephen J. Pearton, | 한국화학공학회 | 2000 ,
7
A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
S. C. Ahn, S. Y. Han, J. L. Lee, J. H. Moon, and, | 대한금속.재료학회 | 2004 ,
8
C₂F 6가스가 Via Etching 특성에 미치는 영향
C₂F 6가스가 Via Etching 특성에 미치는 영향
류지형, 박재돈, 윤기완, | 대한전자공학회 | 2002 ,
9
An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips
An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips
Yeong-Cheol Kim,David N Seidman, | 대한금속.재료학회 | 2003 ,
10
Characteristics of Ru Etching Using O₂/Cl₂Plasmas
Characteristics of Ru Etching Using O₂/Cl₂Plasmas
Hyoun Woo Kim, | 대한금속.재료학회 | 2002 ,
처음12이후마지막