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1 Results:AA:W W LEE PP:한국물리학회 AA:B. S. LIM AA:J. W. BAE 0.328 sec.
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Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl₂/N₂ and Cl₂/Ar Mixtures at Low Bias Power
Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl₂/N₂ and Cl₂/Ar Mixtures at Low Bias Power
J. W. Bae, | 한국물리학회 | 2007 ,
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