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2 Results:AA:T L VINCENT PP:INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS 0.160 sec.
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1
Optimal pulse shaping for plasma processing
Optimal pulse shaping for plasma processing
Tyrone L. Vincent, | Institute of Electrical and Electronics Engineers | 2004 ,
2
Estimating Relative Deposition Rates in a Multi-Source Continuous-Deposition Process Using a Single Composition
Estimating Relative Deposition Rates in a Multi-Source Continuous-Deposition Process Using a Single Composition
M. J. Hilt., | Institute of Electrical and Electronics Engineers | 2006 ,
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