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1
An Industrial Case Study of the ARM 926EJ-S Power Modeling
An Industrial Case Study of the ARM 926EJ-S Power Modeling
Hyunsuk Kim, Seokhoon Kim, Ikhwan Lee, Sungjoo Yo, | 대한전자공학회 | 2005 ,
2
Characteristics of Al2O3 Thin Films Deposited Using Dimethyalluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al2O3 Thin Films Deposited Using Dimethyalluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Jaehyoung Koo, | 한국물리학회 | 2006 ,
3
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Characteristics of Al₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
Koo, Jaehyoung, | 한국물리학회 | 2006 ,
4
Creep-Fatigue Crack Growth Behavior of a Structure with Crack Like Defects at the Welds
Creep-Fatigue Crack Growth Behavior of a Structure with Crack Like Defects at the Welds
Hyeong Yeon Lee., | 대한기계학회 | 2006 ,
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