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12 Results:AA:SUNG-JIN CHO 0.374 sec.
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1
A Finite Horeizon Model for the Optimal Upgrade and Replacement of Mainframe Computer Systems
A Finite Horeizon Model for the Optimal Upgrade and Replacement of Mainframe Computer Systems
SUNG-JIN CHO, | The Korean Economic Association | 2005 ,
2
Adaptive Neural Sliding Mode Control of Nonholonomic Wheeled Mobile Robots With Model Uncertainty
Adaptive Neural Sliding Mode Control of Nonholonomic Wheeled Mobile Robots With Model Uncertainty
Bong Seok Park, | Institute of Electrical and Electronics Engineers | 2009 ,
3
Quantitative Analysis of Lignans in the Fruits of Acanthopanax Species by HPLC
Quantitative Analysis of Lignans in the Fruits of Acanthopanax Species by HPLC
Hye Min Kim, | 한국식품과학회 | 2006 ,
4
cDNA Cloning and Expression Analysis of a CTP: Phosphoethanolamine Cytidylyltransferase from Barley
cDNA Cloning and Expression Analysis of a CTP: Phosphoethanolamine Cytidylyltransferase from Barley
Sung Jin Lee, | 한국식물학회(Adventitous Root Formation | 2005 ,
5
Effective Electrochemical Gating of Hole Transport in Aligned Single-Walled Carbon Nanotube Network Thin film Transistors
Effective Electrochemical Gating of Hole Transport in Aligned Single-Walled Carbon Nanotube Network Thin film Transistors
Bonghyun Park, | 한국물리학회 | 2007 ,
6
Robust Control of Planar Biped Robots in Single Support Phase Using Intelligent Adaptive Backstepping Technique
Robust Control of Planar Biped Robots in Single Support Phase Using Intelligent Adaptive Backstepping Technique
Sung Jin Yoo, | 제어자동화시스템공학회 | 2007 ,
7
Output Feedback Dynamic Surface Control of Flexible-Joint Robots
Output Feedback Dynamic Surface Control of Flexible-Joint Robots
Sung Jin Yoo, | 제어자동화시스템공학회 | 2008 ,
8
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
Sung-jin Kim., | 한국물리학회 | 2006 ,
9
A 37ch Visible Adaptive Optics System for Wavefront Compensation
A 37ch Visible Adaptive Optics System for Wavefront Compensation
Jun Ho Lee., | 한국물리학회 | 2006 ,
10
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
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