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1
Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation With Pattern Density for 65 nm and 90 nm Line Widths
Hye-Young Kang, | 한국물리학회 | 2006 ,
2
Improvement of Column Spzcer Uniformity in a TFT LCD Panel
Improvement of Column Spzcer Uniformity in a TFT LCD Panel
Jung-Hyuk Cho, | 한국물리학회 | 2006 ,
3
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
Sung-jin Kim., | 한국물리학회 | 2006 ,
4
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
5
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Kang, Hye-young, | 한국물리학회 | 2006 ,
6
Improvement of Column Spacer Uniformity in a TFT LCD Panel
Improvement of Column Spacer Uniformity in a TFT LCD Panel
Cho, Jung-hyuk, | 한국물리학회 | 2006 ,
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