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1
Characteristics of boron-Loaded Plastic Scintillators for neutron Measurements
Characteristics of boron-Loaded Plastic Scintillators for neutron Measurements
R. J. Hu, | 한국물리학회 | 2007 ,
2
Effect of Ambient Ar Gas on the Composition Control and Crystalline Properties of TiNi Thin Films Fabricated by Using Pulsed Laser Deposition
Effect of Ambient Ar Gas on the Composition Control and Crystalline Properties of TiNi Thin Films Fabricated by Using Pulsed Laser Deposition
J. S. Ahn, | 한국물리학회 | 2007 ,
3
Neutron-Detection Efficiency of Hybrid Resistive Plate Chambers as Estimated by Using the MC50 Cyclotron at KIRAMS
Neutron-Detection Efficiency of Hybrid Resistive Plate Chambers as Estimated by Using the MC50 Cyclotron at KIRAMS
B. Hong, | 한국물리학회 | 2006 ,
4
Physical and Electrical Characteristics of Atomic-Layer-deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄and SiH[N(CH₃)₂]₃ Precursors
Physical and Electrical Characteristics of Atomic-Layer-deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄and SiH[N(CH₃)₂]₃ Precursors
K. B. Chung, | 한국물리학회 | 2006 ,
5
Neutron Scattering Study of Multifferoic TbMn2O5
Neutron Scattering Study of Multifferoic TbMn2O5
J. Koo, | 한국물리학회 | 2007 ,
6
Formation of Amorphous Phase in the Binary Cu-Zr Alloy System
Formation of Amorphous Phase in the Binary Cu-Zr Alloy System
O.J.Kwon, | 대한금속재료학회 | 2006 ,
7
Development of ductile in-situ crystalline particles reinforced metallic glass matrix composites
Development of ductile in-situ crystalline particles reinforced metallic glass matrix composites
Y.C. Kim, | 대한금속재료학회 | 2005 ,
8
Development of a Li-Coated RPC for Low-Energy Neutron Detection
Development of a Li-Coated RPC for Low-Energy Neutron Detection
K. S. LEE, | 한국물리학회 | 2006 ,
9
Photoluminescence Characteristics of Merocyanine Dyes in Ionic Liquids
Photoluminescence Characteristics of Merocyanine Dyes in Ionic Liquids
T. K. Shim., | 한국물리학회 | 2006 ,
10
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Physical and Electrical Characteristics of Atomic-Layer-Deposited Hf-Silicate Thin Films Using Hf[N(CH₃)(C₂H5)]₄ and SiH[N(CH₃)₂]₃ Precursors
Chung, K. B., | 한국물리학회 | 2006 ,
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