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1
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
Sung-jin Kim., | 한국물리학회 | 2006 ,
2
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Simulation of Rectangular Isolated Pattern Images by Applying Phase Shift Masks in High-Exposure Gaps to Protect LCD Photo Masks
Jung-hyuk Cho., | 한국물리학회 | 2006 ,
3
Nanoscale Lines Patterned by 1 : 1 Electron-Beam Projection Lithography Using an Electron Emission Mask
Nanoscale Lines Patterned by 1 : 1 Electron-Beam Projection Lithography Using an Electron Emission Mask
Kwang Nam Choi., | 한국물리학회 | 2006 ,
4
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Kang, Hye-young, | 한국물리학회 | 2006 ,
5
Dewetting된 Pt Islands를 Etch Mask로 사용한 GaN, 나노구조 제작
Dewetting된 Pt Islands를 Etch Mask로 사용한 GaN, 나노구조 제작
김택승, 이지면, | 한국재료학회 | 2006 ,
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