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1
Isolation of a Tryptophan-Overproducing Strain Generated by EMS Mutagenesis of Candida rugosa
Isolation of a Tryptophan-Overproducing Strain Generated by EMS Mutagenesis of Candida rugosa
Sunhye Kim, Yumi Ha, Hyoungjoon Youm, Gilhwan An,, | Korean Socity of Food Science&Nutrition | 2004 ,
2
Strength and strain enhancements of concrete columns confined with FRP sheets
Strength and strain enhancements of concrete columns confined with FRP sheets
G. Campione, N. Miraglia, M. Papia, | 국제구조공학회(TECNO-PRESS) | 2004 ,
3
Assumed strain finite strip method using the non-periodic B-spline
Assumed strain finite strip method using the non-periodic B-spline
Hyun-Seok Hong, Kyeong-Ho Kim, Chang-Koon Choi, | 국제구조공학회(TECNO-PRESS) | 2004 ,
4
Solids 3-D with bounded tensile strength under the action of thermal strains. Theoretical aspects and numerical procedures
Solids 3-D with bounded tensile strength under the action of thermal strains. Theoretical aspects and numerical procedures
Giovanni Pimpinelli, | 국제구조공학회(TECNO-PRESS) | 2004 ,
5
High Temperature Soybean Fermentation Using Microbial Strains Isolated at High Temperatures
High Temperature Soybean Fermentation Using Microbial Strains Isolated at High Temperatures
Na-Young Lee, Yong-Suk Kim, Myung-Woo Byun, Dong-, | Korean Societyof Food Science&Technology | 2004 ,
6
Isolation of the White Pelicle-Forming Strain from Gochujang, Growth Inhibition and Its Effect on Quality of Gochujang
Isolation of the White Pelicle-Forming Strain from Gochujang, Growth Inhibition and Its Effect on Quality of Gochujang
Seong-Il Lim, Eun-Jung Kwak, Cheong Choi, | Korean Societyof Food Science&Technology | 2004 ,
7
Strained Si/Relaxed SiGe/SiO2/Si 구조 FD n-MOSFET의 전자이동도에 Ge mole fraction과 strained Si 층 두께가 미치는 영향
Strained Si/Relaxed SiGe/SiO2/Si 구조 FD n-MOSFET의 전자이동도에 Ge mole fraction과 strained Si 층 두께가 미치는 영향
백승혁, 심태헌, 문준석, 차원준, 박재근, | 대한전자공학회 | 2004 ,
8
A Study on the Strain Stability of Si/SiGe Layer Structure in a Heterojunction Bipolar Transistor during Thermal Processing
A Study on the Strain Stability of Si/SiGe Layer Structure in a Heterojunction Bipolar Transistor during Thermal Processing
Zhihong Liu, Changchun Chen, Wentao Huang, | 대한금속.재료학회 | 2004 ,
처음1마지막
1
Harmony
Symphony Orchestra Institute [, ]
2
Strain
Blackwell Publishing Limited [, ]