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A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
A Study on the Reactive Ion Etching of SiC Single Crystals Using Inductively Couplde Plasma of SF-Based Gas Mixtures
S. C. Ahn, S. Y. Han, J. L. Lee, J. H. Moon, and, | 대한금속.재료학회 | 2004 ,
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