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971
Effect of a Sonusoidal Field in a Switching Magnet for a Proton Beam Accelerator
Effect of a Sonusoidal Field in a Switching Magnet for a Proton Beam Accelerator
Heung Sik Kang, | 한국물리학회 | 2006 ,
972
Time-Resolved Photoluminescence in CdSe/CdZnSe and CdSe/CdMnSe Coupled Quantum Dot Structures
Time-Resolved Photoluminescence in CdSe/CdZnSe and CdSe/CdMnSe Coupled Quantum Dot Structures
Eunsoon Oh., | 한국물리학회 | 2006 ,
973
One-Dimensional Ordered Structure of C₂H₄ on a Si(001) Surface
One-Dimensional Ordered Structure of C₂H₄ on a Si(001) Surface
J. H. Seo., | 한국물리학회 | 2006 ,
974
A 37ch Visible Adaptive Optics System for Wavefront Compensation
A 37ch Visible Adaptive Optics System for Wavefront Compensation
Jun Ho Lee., | 한국물리학회 | 2006 ,
975
Size Analysis of CdSe/ZnS Quantum Dots in Aqueous Solution by Using Laser-Induced Breakdown Detection
Size Analysis of CdSe/ZnS Quantum Dots in Aqueous Solution by Using Laser-Induced Breakdown Detection
Ji-woong Kim., | 한국물리학회 | 2006 ,
976
Inner Tracker Design Studies for a Large Gaseous Tracker Detector
Inner Tracker Design Studies for a Large Gaseous Tracker Detector
E. Won., | 한국물리학회 | 2006 ,
977
Self-Organized Process for Patterning of a Thin-Film Transistor
Self-Organized Process for Patterning of a Thin-Film Transistor
Byoung-kwon Choo., | 한국물리학회 | 2006 ,
978
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
979
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
980
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Wonjoon Choi., | 한국물리학회 | 2006 ,
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