본문

  1. Home
1000 Results:AA:M W CHO 0.562 sec.
RSS 
Multilingual
 Advanced Search
 New arrival Search
Selected Print Select Export to Excel
951
Development of a High-Power Klystron for Radio-Frequency Linear Accelerators
Development of a High-Power Klystron for Radio-Frequency Linear Accelerators
S. J. PARK, | 한국물리학회 | 2006 ,
952
Effect of a Sonusoidal Field in a Switching Magnet for a Proton Beam Accelerator
Effect of a Sonusoidal Field in a Switching Magnet for a Proton Beam Accelerator
Heung Sik Kang, | 한국물리학회 | 2006 ,
953
Origin of the Parasitic(7 7 17) Domain on Reconstructed Si(5 5 12)-2×1
Origin of the Parasitic(7 7 17) Domain on Reconstructed Si(5 5 12)-2×1
Sanghee Cho., | 한국물리학회 | 2006 ,
954
A 37ch Visible Adaptive Optics System for Wavefront Compensation
A 37ch Visible Adaptive Optics System for Wavefront Compensation
Jun Ho Lee., | 한국물리학회 | 2006 ,
955
Photo-Neutrons Produced at the Pohang Neutron Facility Based on an Electron Linac
Photo-Neutrons Produced at the Pohang Neutron Facility Based on an Electron Linac
K. Devan., | 한국물리학회 | 2006 ,
956
Boron-Purity-Dependent Raman Spectra of CaB6
Boron-Purity-Dependent Raman Spectra of CaB6
M. Song., | 한국물리학회 | 2006 ,
957
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Bonding Structure and Electrical Properties of SiOC(-H) Films Deposited with a Methyltrimethoxysilane Precursor by Using Inductively Coupled Plasma Chemical Vapor Deposition
Kannan Meera., | 한국물리학회 | 2006 ,
958
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
A study on the Plasma Parameters and Characteristics of Carbon-Doped Silicon-Oxide Films by Using MTMS/O₂ and He Plasmas
Min Sung Kang., | 한국물리학회 | 2006 ,
959
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Application of a High-Durability DC arc Plasmatron to Plasma-Chemical Processing of Silicon Substrates
Valentin A. Riaby., | 한국물리학회 | 2006 ,
960
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Analysis of Chemical Bond States and Electrical Properties of Stacked AlON/HfO₂ Gate Oxides Formed by Using a Layer-by-Layer Technique
Wonjoon Choi., | 한국물리학회 | 2006 ,
처음이전919293949596979899100이후마지막