본문

  1. Home
1000 Results:AA:KANG B 0.533 sec.
RSS 
다국어입력
 상세검색
 신착검색
선택출력 선택엑셀내보내기
951
Structure of Oxide Film Prepared by Two-step Anodization of Aluminum
Structure of Oxide Film Prepared by Two-step Anodization of Aluminum
Eunseong Ko, | 한국부식방식학회(구)한국부식학회 | 2006 ,
952
Three Dimensional Shape Measurement of a Micro Fresnel Lens with In-line Phase-shifting Digital holographic Microscopy
Three Dimensional Shape Measurement of a Micro Fresnel Lens with In-line Phase-shifting Digital holographic Microscopy
Jeon Woong kang, | 한국광학회 | 2006 ,
953
Signal Processing Techniques to Detect a Surface-Breaking Crack by Using a Laser Surface Wave
Signal Processing Techniques to Detect a Surface-Breaking Crack by Using a Laser Surface Wave
Seung-Kyu Park, | 한국물리학회 | 2007 ,
954
Fluorescence Excitation and Resonant Two-Photon Ionization Spectroscopy of Fluorene Cooled in Pulsed Molecular Beams: Vibronic Assignment based on a RCIS Calculation
Fluorescence Excitation and Resonant Two-Photon Ionization Spectroscopy of Fluorene Cooled in Pulsed Molecular Beams: Vibronic Assignment based on a RCIS Calculation
Bong Hyun Boo, | 한국물리학회 | 2007 ,
955
Negative-Ion Mass Spectrometric Study of Ion-Pair Formation from Photoexcited 1, 1-Difluoroethene in the Range of 12.4~31.0 eV
Negative-Ion Mass Spectrometric Study of Ion-Pair Formation from Photoexcited 1, 1-Difluoroethene in the Range of 12.4~31.0 eV
Bong Hyun Boo, | 한국물리학회 | 2007 ,
956
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Mingde Xu, | 한국물리학회 | 2007 ,
957
Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Chemical States and Band-Gap Energy for Plasma-Nitrided Ultrathin Si Oxynitride Film
Hua Jin, | 한국물리학회 | 2007 ,
958
Effects of the Size and the Concentration of the Abrasive in a Colloidal Silica (SiO2) Slurry with Added TMAH on Removal Selectivity of Polysilicon and Oxide Films in Polysilicon Chemical Mechanical Polishing
Effects of the Size and the Concentration of the Abrasive in a Colloidal Silica (SiO2) Slurry with Added TMAH on Removal Selectivity of Polysilicon and Oxide Films in Polysilicon Chemical Mechanical Polishing
Kyung-Woong Park, | 한국물리학회 | 2007 ,
959
Wall-Controlled Growth of CNTs for X-ray Electron Sources
Wall-Controlled Growth of CNTs for X-ray Electron Sources
Chang-Duk Kim, | 한국물리학회 | 2007 ,
960
Optical and Hall Properties of ZnO Thin Films Fabricated by Using the Pulsed Laser Deposition Method at Various Oxygen Pressures and Substrate Temperatures
Optical and Hall Properties of ZnO Thin Films Fabricated by Using the Pulsed Laser Deposition Method at Various Oxygen Pressures and Substrate Temperatures
Seong-Jun Kang, | 한국물리학회 | 2007 ,
처음이전919293949596979899100이후마지막